FT IV
Across
- 2. Basic logic gate built using one NMOS and one PMOS
- 5. Pattern transfer step where unprotected regions are removed
- 8. Oxide layer grown thermally on silicon
- 9. Technology that combines both NMOS and PMOS transistors
Down
- 1. Spreading of junctions due to atomic movement at high temperature
- 3. Minimum gate voltage required to form a conducting channel
- 4. Process of driving dopant ions into the wafer at high energy
- 6. MOS device where electrons are the majority carriers
- 7. MOS device where holes are the majority carriers
- 9. Wafer film deposition using reactive precursor gases (abbr.)