Integrated Circuits

2. Integrated circuits that are included entirely on a single chip of semiconductor are called ___ circuits
5. ___process is used to etch the oxide–nitride stack(short form)
6. the voltage betweenthe gate and source of the p- channel device is ___(include the sign also)
9. We can illustrate most of the common fabrication steps for MOS integrated circuits by studying the flow of a twin- well ____CMOS process
11. ___ isolation provides superior electrical isolation compared with LOCOS, and uses less Si real estate

1. who observed that the number of transistors on a computer chip was doubling about every 18–24 months
3. procedure, where Si is oxidized to form SiO2 in regions not protected by nitride, is called___(short form)
4. A ____ circuit may contain one or more monolithic circuits or individual transistors bonded to an insulating substrate with resistors, capacitors, or other circuit elements, together with appropriate interconnections
7. the integration of 10^5-10^6 devices is known as __
8. Under certain biasing conditions the p- n- p part of the structure can supply base current to the n-p-n structure, causing a large current to flow. This process is called ____
10. A particularly useful device for digital applications is a combination of n- channel and p- channel MOS transistors on adjacent regions of the